The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.

通过电镜实验,观察到水合二氧化具有微米亚微米纳米三次结。

Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.

水汽氧化是以高纯水蒸汽为氧化气氛，由片表面的原子和水分子反应生成二氧化。